Title:
Catalyzing hydrogen production: Exploring plasmonic effects in self-assembled CuO/Cu2O thin films via pulsed laser deposition

dc.contributor.authorAshish K. Ranjan
dc.contributor.authorPardeep K. Jha
dc.contributor.authorPriyanka A. Jha
dc.contributor.authorPrabhakar Singh
dc.date.accessioned2026-02-09T04:30:50Z
dc.date.issued2024
dc.description.abstractPlasmonic catalysis triggers the dissociation of H 2 or adsorbed O 2 (sluggish processes) under continuous wave excitation via plasmon decay. This is coupled to interband or intraband excitation of d-band or sp-band, respectively, to levels above fermi level of metals. Here, we have studied the plasmonic and photocatalytic behavior in an environment friendly medium with AM 1.5 G sunlight of CuO/ Cu 2 O thin films fabricated by pulsed laser deposition technique in vacuum with varying thickness. We have achieved ∼ 0.59 kmol h − 1 g − 1 H 2 production in the CuO/ Cu 2 O film with a thickness of ∼ 27 nm. The role of plasmons with metal-dielectric and semiconductor-semiconductor interfaces is conducted through both experimental and theoretical approaches. The results suggest that the impact of plasmonic catalysis/synthesis is subject to the dimension, composition, and band alignment of two interface materials. © 2024 Author(s).
dc.identifier.doi10.1063/5.0188802
dc.identifier.issn218979
dc.identifier.urihttps://doi.org/10.1063/5.0188802
dc.identifier.urihttps://dl.bhu.ac.in/bhuir/handle/123456789/48032
dc.publisherAmerican Institute of Physics
dc.titleCatalyzing hydrogen production: Exploring plasmonic effects in self-assembled CuO/Cu2O thin films via pulsed laser deposition
dc.typePublication
dspace.entity.typeArticle

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