Prasad R.D.Teli S.B.Prasad R.S.Prasad R.B.Prasad S.R.Sinha P.Sinha A.Sinha P.Saxena M.Prasad R.R.Pande R.S.Charmode N.Deshmukh K.G.Sarvalkar P.D.Kadam U.D.Chiplunkar C.Prasad N.Padvi M.V.Guo Z.2025-01-132025-01-13202425780611https://dl.bhu.ac.in/ir/handle/123456789/1345Over the last 200 years, there has been an increase in the process of depositing thin film materials, which has been considerably developing. A good understanding of the various deposition methods and processes is necessary to improve the desired film thickness and characteristics. The purpose of this review paper is to display the critical analysis of existing thin film deposition methods. The paper discusses some important thin film techniques that are advanced and suitable for the analysis of thin films. Nanomaterials are invisible and require various advanced characterization to investigate their physical and chemical properties. Therefore, it becomes essential to determine these properties: there is a need for advanced scientific tools for the analysis of nanomaterials and thin films. A comprehensive list of fundamentals of thin film technology, including deposition, structure, film properties, advanced characterization tools and applications are presented together. � Engineered Science Publisher LLC 2024.enApplicationsCharacterization toolsDeposition techniquesElectrical propertiesNanomaterialsOptical properties, mechanical propertiesThin FilmsReview10.30919/esmm1198